Conductive paste and method for manufacturing the same, wiring using the conductive paste and method for manufacturing the same

ABSTRACT

The present invention relates to a conductive paste in which fine metal particles are dispersed into a chemical adsorption liquid produced from a mixture of at least an alkoxysilane compound, a silanol condensation catalyst, and a nonaqueous organic solvent to form an organic thin film comprising molecules covalently bound to the surface of the fine metal particle by having the surface of the fine metal particle react with the alkoxysilane compound, so that fine metal particles that are given a reactive function to the surface are produced while almost maintaining the original conductivity of the fine metal particles, and further the particles are pasted with an organic solvent.

CROSS-REFERENCE TO RELATED PATENT APPLICATIONS

The present application is a divisional application under 35 U.S.C. §121of U.S. patent application Ser. No.12/665,027, filed on Dec. 16, 2009,now U.S. Pat. No. 8,623,500, which is a national stage application under35 U.S.C. §371 of International Application No. PCT/JP2007/066314 filedon Aug. 16, 2007, the entire contents of both of which are incorporatedherein by reference in their entireties.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention is related to a conductive paste and the methodfor manufacturing the same, and a wiring using the conductive paste andthe method for manufacturing the same. In particular, it relates to aconductive paste using conductive fine particles, which are given eitherthermal reactivity or light reactivity, or otherwise radical reactivityor ionic reactivity to the surface of fine metal particles, and themethod for manufacturing the same, and also relates to a wiring usingsuch conductive paste and the method of manufacturing the same, andfurther relates to electronic components and electronic equipmentthereof.

In the present invention, tine metal particle includes fine metalparticles made of gold, silver, copper, and nickel, or silver-platedprecious metal, copper, and nickel. In addition, it includes conductivefine metal oxide particles, such as ITO and SnO₂.

2. Description of Related Art

In the electronics industry, a number of wirings in which a conductivepaste, such as a gold paste or silver paste, is applied and sinteredhave been traditionally used.

However, the traditional wirings where a conductive paste containing abinder was sintered could not obtain a high conductivity unless it wassintered at a high temperature. In addition, if it needs to be sinteredat a high temperature, the base material is limited to a heat-resistantbase material. Furthermore, since the wiring is not bound to the surfaceof the base material, there is a problem in the resistance toexfoliation. For example, a related patent is listed as a referencebelow.

-   [Patent document 1] Japanese Patent Laid-Open No. 2004-356053

The present invention aims to provide a conductive paste and wiringsthereof, which allow to lower the sintering temperature of theconductive paste compared to the conventional sintered wirings and offeran excellent adhesiveness to the base material allowing the formation ofthe wirings with a higher conductivity by hardening without a binderwhile the wirings are made of a hardened conductive paste.

SUMMARY OF THE INVENTION

The first aspect of this invention, which is presented in order to solvethe above described problems, is a conductive paste comprising finemetal particles that are covered by an organic thin film covalentlybound to the surface.

The second aspect of this invention is the conductive paste of the firstaspect of this invention in which the organic thin film covalently boundto the surface comprises molecules that include a functional group atone end and covalently bind to the surface of the fine metal particlevia Si or S at the other end.

The third aspect of this invention is the conductive paste of the secondaspect of this invention in which the functional group is a reactivefunctional group.

The fourth aspect of this invention is the conductive paste of the thirdaspect of this invention in which the reactive functional group is afunctional group with either thermal reactivity or light reactivity, orotherwise radical reactivity or ionic reactivity.

The fifth aspect of this invention is the conductive paste of the thirdaspect of this invention in which the reactive functional group iseither an epoxy group or imino group, or otherwise a chalcone group.

The sixth aspect of this invention is the conductive paste of the firstand second aspects of this invention in which the organic thin filmcovalently bound to the surface comprises a monomolecular film.

The seventh aspect of this invention is a method for manufacturing aconductive paste comprising a process of having the surface of the finemetal particle react with an alkoxysilane compound by dispersing thefine metal particles among a chemical adsorption liquid produced from amixture of at least the alkoxysilane compound, a silanol condensationcatalyst, and a nonaqueous organic solvent.

The eighth aspect of this invention is the method for manufacturing aconductive paste of the seventh aspect of this invention comprising theprocess of having the surface of the conductive paste react with analkoxysilane compound by dispersing the fine metal particles among achemical adsorption liquid and then cleaning the surface of the finemetal particle with an organic solvent to form a monomolecular filmcovalently bound to the surface of the fine metal particle.

The ninth aspect of this invention is the method for manufacturing aconductive paste of the seventh aspect of this invention in which aketimine compound, organic acid, aldimine compound, enamine compound,oxazolidine compound, or an aminoalkylalkoxysilane compound is usedinstead of the silanol condensation catalyst.

The tenth aspect of this invention is the method for manufacturing aconductive paste of the seventh aspect of this invention in which atleast one promoter chosen from a ketimine compound, organic acid,aldimine compound, enamine compound, oxazolidine compound, or anaminoalkylalkoxysilane compound is mixed with the silanol condensationcatalyst for use.

The eleventh aspect of this invention is a wiring in which fine metalparticles covered by a first organic thin film covalently bound to thesurface and fine metal particles covered by a second organic thin filmcovalently bound to the surface are mixed to be hardened into a form bya covalent bond with each other via the foregoing organic thin films.

The twelfth aspect of this invention is the wiring of the eleventhaspect of this invention in which the first and second organic thinfilms covalently bound to the respective surfaces comprise moleculesthat include a reactive functional group at one end and covalently bindto the surface of the conductive fine metal particle via Si or S at theother end.

The thirteenth aspect of this invention is the wiring of the twelfthaspect of this invention in which the reactive functional group is afunctional group with either thermal reactivity or light reactivity, orotherwise radical reactivity or ionic reactivity.

The fourteenth aspect of this invention is the wiring of the twelfthaspect of this invention in which the reactive functional group iseither an epoxy group or imino group, or otherwise a chalcone group.

The fifteenth aspect of this invention is the wirings of the eleventhand twelfth aspects of this invention in which the organic thin filmcovalently bound to the surface comprises a monomolecular film.

The sixteenth aspect of this invention is the wirings of the elevenththrough fifteenth aspects of this invention, inclusive, in which thesurface of a base material covered by an organic thin film containing afirst or a second reactive functional group covalently bound to thesurface, and the mixture of the fine metal particles covered by thefirst organic thin film covalently bound to the surface and the finemetal particles covered by the second organic thin film covalently boundto the surface are covalently bound with each other via the foregoingorganic thin films, respectively, to be hardened into a form.

The seventeenth aspect of this invention is a method for manufacturing awiring comprising: a process of forming a paste by mixing in an organicsolvent to the fine metal particles covered by an organic filmcontaining the first reactive functional group covalently bound to thesurface and the fine metal particles covered by an organic filmcontaining the second reactive functional group covalently bound to thesurface; a process of applying to the surface of the base material; anda process of hardening.

The eighteenth aspect of this invention is the method for manufacturinga wiring of the seventeenth aspect of this invention in which prior tothe application of the paste to the base material, an organic thin filmcontaining a functional group that reacts with the first or secondreactive functional group on the surface of the fine metal particlecovered by the organic film containing the first reactive functionalgroup or of the fine metal particle covered by the organic filmcontaining the second reactive functional group is bound to the surfaceof the base material.

The nineteenth aspect of this invention is an electronic component inwhich the conductive pastes of the first through sixth aspects of thisinvention, inclusive, and the wirings of the tenth through fifteenthinventions, inclusive, are used.

The twentieth aspect of this invention is electronic equipment in whichthe conductive pastes of the first through sixth aspects of thisinvention, inclusive, and the wirings of the tenth through fifteenthaspects of this invention, inclusive, are used.

The gist of the present invention is further explained hereinafter.

The gist of the present invention provides a conductive paste in whichfine metal particles are dispersed into a chemical adsorption liquidproduced from a mixture of at least an alkoxysilane compound, a silanolcondensation catalyst, and a nonaqueous organic solvent to form anorganic thin film comprising molecules covalently bound to the surfaceof the fine metal particle by having the surface of the fine metalparticle react with the alkoxysilane compound, so that fine metalparticles that are given a reactive function to the surface are producedwhile almost maintaining the original conductivity of the fine metalparticles, and further the particles are pasted with an organic solvent.

In addition, the gist of the present invention provides a conductivepaste in which after a process of having the surface of the fine metalparticle react with an alkoxysilane compound by dispersing the finemetal particles among a chemical adsorption liquid, the fine metalparticles that are given a reactive function are pasted with an organicsolvent while almost maintaining the original shape and conductivity ofthe fine metal particles by cleaning the surface of the fine metalparticles with an organic solvent to cover with a monomolecular filmcovalently bound to the surface of the fine metal particles.

In so doing, a ketimine compound, organic acid, aldimine compound,enamine compound, oxazolidine compound, or an aminoalkylalkoxysilanecompound can be used instead of the silanol condensation catalyst;however, if at least one promoter chosen from a ketimine compound,organic acid, aldimine compound, enamine compound, oxazolidine compound,or an aminoalkylalkoxysilane compound is mixed with the silanolcondensation catalyst, it advantageously allows a reduction of thereaction time.

In addition, if the organic thin film covalently bound to the surfacecomprises molecules that contain a functional group with either thermalreactivity or light reactivity, or otherwise radical reactivity or ionicreactivity, such as an epoxy group, imino group, or a chalcone group, atone end and covalently bind to the surface of the fine metal particlevia Si or S at the other end, it is advantageous for quickly hardeningthe conductive paste.

In addition, if the organic thin film covalently bound to the surfacecomprises a monomolecular film, it is advantageous to increase thedensity of the conductive paste when hardening.

Furthermore, the gist of the present invention provides a wiring inwhich the fine metal particles covered by the first organic thin filmcovalently bound to the surface and the fine metal particles covered bythe second organic thin film covalently bound to the surface are mixedto be hardened into a form by a covalent bond via the foregoing organicthin films with each other through a process of forming a paste bymixing in an organic solvent to the fine metal particles covered by theorganic film containing the first reactive functional group covalentlybound to the surface and the fine metal particles covered by the organicfilm containing the second reactive functional group covalently bound tothe surface; a process of applying to the surface of the base material;and a process of hardening.

In so doing, if the first and second organic thin films covalently boundto the respective surfaces comprise molecules that include a reactivefunctional group at one end and covalently bind to the surface of theconductive fine metal particle via Si or S at the other end, it isadvantageous to directly give a reactivity to the fine metal particle.

In addition, if the reactive functional group is a functional group witheither thermal reactivity or light reactivity, or otherwise radicalreactivity or ionic reactivity, it is advantageous for performing athermal solidification or photo-setting of the paste.

Furthermore, if the reactive functional group is an epoxy group or iminogroup with thermal reactivity, or otherwise a chalcone group with lightreactivity, it advantageously allows for a lowering of the curingtemperature.

Furthermore, if the organic thin film covalently bound to the surfacecomprises a monomolecular film, it is advantageous to improve theconductivity of the wiring.

Prior to the application of the paste to the base material, if anorganic thin film containing a functional group that reacts with thefirst or second reactive functional group on the surface of the finemetal particle covered by the organic film containing the first reactivefunctional group or of the fine metal particle covered by the organicfilm containing the second reactive functional group is bound to thesurface of the base material, the first or second reactive functionalgroup on the surface of the fine metal particles reacts with thefunctional group that reacts with the first or second reactivefunctional group on the surface of the base material to covalently bindthe fine metal particles to the surface of the base material via theforegoing respective organic thin films; therefore, it is advantageousto improve the adhesion performance of the wiring to the base material.

According to the present invention, it has the particular effect ofproviding a wiring of a hardened conductive paste with a lowerresistance compared to the traditional sintered wirings, while thewiring is made of a hardened conductive paste. It also has the effect ofimproving the resistance to exfoliation.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a conceptual diagram of Example 1 of the present inventionthat enlarges the reaction of the fine silver particle to the molecularlevel. FIG. 1A shows the surface of the fine silver particle before thereaction. FIG. 1B shows the surface after a monomolecular filmcontaining an epoxy group is formed. FIG. 1C shows the surface after amonomolecular film containing an amino group is formed.

FIG. 2 is a conceptual diagram of Example 2 of the present inventionthat enlarges the wiring to the fine silver particle level. It shows thesurface after heating and hardening of a base material where a mixtureof almost the same amount of fine silver particles E on which amonomolecular film containing an epoxy group was formed and fine silverparticles A on which a monomolecular film containing an amino group wasformed, was applied by printing to the surface of the base material onwhich a monomolecular film containing an epoxy group was formed.

DETAILED DESCRIPTION

The present invention provides a high performance conductive pastethrough processes where at least the fine metal particles are dispersedinto a chemical adsorption liquid produced from a mixture of analkoxysilane compound, a silanol condensation catalyst, and a nonaqueousorganic solvent to have the surface of the fine metal particles reactwith the alkoxysilane compound, and then the surface of the fine metalparticles is cleaned with an organic solvent to produce fine metalparticles that are given a reactive function to the surface while almostcompletely maintaining the original conductivity of the fine metalparticles, and further forming a paste by mixing in an organic solventto the fine metal particles covered by the organic film containing thefirst reactive functional group covalently bound to the surface and thefine metal particles covered by the organic film containing the secondreactive functional group covalently bound to the surface.

Furthermore, the present invention provides a wiring in which fine metalparticles covered by a first organic thin film covalently bound to thesurface and fine metal particles covered by a second organic thin filmcovalently bound to the surface are mixed to be hardened into a form bya covalent bond with each other via the foregoing organic thin filmsthrough a process of applying the foregoing conductive paste to thesurface of the base material, and a process of hardening.

Therefore, the present invention works to provide a conductive pastethat is given reactivity to the surface of the fine metal particlesthemselves without using a binder while almost completely maintainingthe original shape and conductivity of the fine metal particles, andfurther works to provide a high performance wiring, electroniccomponents, and electronic equipment thereof in which the conductivepaste is hardened into a form by using the functionality.

Although examples are hereinafter used to describe the details of thepresent invention, these examples shall not be construed as limiting ofthe present invention.

The fine metal particles according to the present invention include fineparticles made of gold, silver, copper, nickel, or silver-platedprecious metal, copper, and nickel. First, the fine silver particle isused to explain the representative example.

EXAMPLE 1

First, an anhydrous fine silver particle 1 with a particle diameter ofabout 500 nm was prepared and dried thoroughly. Next, as a chemicaladsorption agent, an agent containing a reactive functional group (e.g.,epoxy group or imino group) at the functional site and an alkoxysilylgroup at the other end, for example the agent shown in the followingchemical formula [Formula 1] or [Formula 2], was measured to be 99 with%, and as a silanol condensation catalyst, for example, dibutyltindiacetylacetonate or acetic acid (a type of organic acid) was measuredto be 1 with %, respectively. These were dissolved into a siliconesolvent (e.g., a mixed solvent with 50% of hexamethyldisiloxane and 50%of dimethylformamide) to prepare a chemical adsorption liquid so that ithad a concentration of about 1 with % (preferably, the concentration ofthe chemical adsorption agent is about 0.5 to 3%).

The anhydrous fine silver particles were mixed and stirred in thisadsorption liquid and reacted in a normal atmosphere (45% relativehumidity) for two hours. In this case, since the surface of theanhydrous fine silver particle is bound with a lot of hydroxyl groups 2(shown in FIG. 1A), a chemical adsorption monomolecular film 3containing epoxy groups, or a chemical adsorption film 4 containingamino groups, which forms a chemical bond with the surface of the finesilver particle throughout the surface, was formed at a thickness ofabout 1 nm because of the bonding formation shown in the followingchemical formula [Formula 3] or [Formula 4] by a dealcoholizationreaction (in this case, de-CH₃OH) between the Si(OCH₃) group of theforegoing chemical adsorption agent and the foregoing hydroxyl groupsunder the presence of the silanol condensation catalyst or acetic acid,a type of organic acid (shown in FIGS. 1B and 1C).

When using an adsorption agent containing an amino group, it was betterto use an organic acid, such as acetic acid, since the tintype catalystproduced a deposition. Although the amino group contains an imino group,substances such as pyrrole derivative and imidazole derivatives otherthan the amino group also contain the imino group. Furthermore, when aketimine derivative was used, the amino group was easily introduced byhydrolysis after the coating formation.

Then, a chlorinated solvent was added to the mixture and stirred forcleaning (chloroform was used in this example), and thus, fine silverparticles of which the surfaces were covered by a chemical adsorptionmonomolecular film containing a reactive functional group, for example,an epoxy group or amino group, were manufactured, respectively.

Since this processed part had an extremely thin coating with a filmthickness at the nanometer level, the size and the conductivity of thefine silver particle were hardly impaired.

When it was removed from the atmosphere without cleaning, the reactivitywas almost the same; however, the solvent evaporated and the chemicaladsorption agent left behind on the surface of the fine silver particlereacted at the surface of the fine silver particle with the moisture inthe atmosphere, and a fine silver particle was then obtained on which anextremely thin polymer coating was formed from the foregoing chemicaladsorption agent on the surface of the fine silver particle.

Since this method has a feature of using a dealcoholization reaction, itis applicable to a substance, such as fine silver particles, which canbe damaged by an acid.

Then, the same amount of fine silver particles 5 and 6 covered by thechemical adsorption monomolecular film with the foregoing epoxy group oramino group were sampled, respectively, and mixed well in an isopropylalcohol to form a paste. When the paste was applied to the surface of abase material in a pattern with a screen printing machine and heated at50 to 100 degrees Celsius (in the case of a functional group with lightreactivity, the solvent shall be evaporated and then shall be irradiatedby a light), the isopropyl alcohol was evaporated, and the epoxy groupand amino group were added by the reaction shown in the followingchemical formula [Formula 5] to bind and solidify the fine silverparticles, allowing to form a conductor wiring with the conductivity of0.2×10⁶ Siemens.

EXAMPLE 2

In Example 1, if an organic thin film 12 with a reactive functionalgroup (e.g., epoxy group) was also formed on the surface of the basematerial 11 in the same method prior to the printing application of theforegoing conductive paste followed by heating and hardening, a part ofthe organic thin film on the surface of the fine silver particles (e.g.,where covered by an amino group) forms a covalent bond by a reactionalso with the organic thin film on the surface of the base material asshown in FIG. 2, allowing to manufacture an electrode wiring 13 with ahigh resistance to exfoliation.

Although the above Example 1 used the substance shown in [Formula 1] or[Formula 2] as a chemical adsorption agent containing a reactive group,the following substances (1) through (16), inclusive, other than thosedescribed above could also be used:(CH₂OCH)CH₂—O—(CH₂)₇Si(OCH₃)₃  (1)(CH₂OCH)CH₂—O—(CH₂)₁₁Si(OCH₃)₃  (2)(CH₂CHOCH(CH₂)₂)CH(CH₂)₂Si(OCH₃)₃  (3)(CH₂CHOCH(CH₂)₂)CH(CH₂)₄Si(OCH₃)₃  (4)(CH₂CHOCH(CH₂)₂)CH(CH₂)₆Si(OCH₃)₃  (5)(CH₂OCH)CH₂—O—(CH₂)₇Si(OC₂H₅)₃  (6)(CH₂OCH)CH₂—O—(CH₂)₁₁Si(OC₂H₅)₃  (7)(CH₂CHOCH(CH₂)₂)CH(CH₂)₂Si(OC₂H₅)₃  (8)(CH₂CHOCH(CH₂)₂)CH(CH₂)₄Si(CH₂H₅)₃  (9)(CH₂CHOCH(CH₂)₂)CH(CH₂)₆Si(OC₂H₅)₃  (10)H₂N(CH₂)₅Si(OCH₃)₃  (11)H₂N(CH₂)₇Si(OCH₃)₃  (12)H₂N(CH₂)₉Si(OCH₃)₃  (13)H₂N(CH₂)₅Si(OC₂H₅)₃  (14)H₂N(CH₂)₇Si(OC₂H₅)₃  (15)H₂N(CH₂)₉Si(OC₂H₅)₃  (16)

Hereinabove, the (CH₂OCH) group represents a functional group shown inthe following formula [Formula 6], and the (CH₂CHOCH(CH₂)₂)CH grouprepresents a functional group shown in the following formula [Formula7].

In addition, the above example used a chemical adsorption agentcontaining a group with thermal reactivity or ionic reactivity, and thefollowing substances (21) through (29), inclusive, could also be used asthose with light reactivity:CH≡C—C≡C(CH₂)₁₅SiCl₃  (21)CH≡C—C≡C(CH₂)₂Si(CH₃)₂(CH₂)₁₅SiCl₃  (22)CH≡C—C≡C(CH₂)₂Si(CH₃)₂(CH₂)₉SiCl₃  (23)CH₃(CH₂)₃C≡C—C≡C(CH₂)₁₅SiCl₃  (24)CH₃(CH₂)₃C≡C—C≡C(CH₂)₂Si(CH₃)₂(CH₂)₁₅SiCl₃  (25)CH₃(CH₂)₃C≡C—C≡C(CH₂)₂Si(CH₃)₂(CH₂)₉SiCl₃  (26)(C₆H₅)(CH)₂CO(C₆H₄)O(CH₂)₆OSi(OCH₃)₃  (27)(C₆H₅)(CH)₂CO(C₆H₄)O(CH₂)₈OSi(OC₂H₅)₃  (28)(C₆H₅)CO(CH)₂(C₆H₄)O(CH₂)₆OSi(OCH₃)₃  (29)

Where (C₆H₅)(CH)₂CO(C₆H₄)— and (C₆H₅)CO(CH)₂(C₆H₄)— represent chalconegroups.

In addition, in the case that the material of the fine particle is madeof Au, although it does not have a hydroxyl group on the surface, whenan agent in which the SiCl₃ group or Si(OCH₃)₃ at the terminal positionwas replaced with the SH group, or a triazinethiol group was used as achemical adsorption agent (e.g., H₂N(CH₂)_(n)—SH (where n is a wholenumber)), or in particular, when H₂N(CH₂)₁₁—SH or a similar formula wasused, a fine gold particle with a formation of a monomolecular filmcontaining an amino group via S was manufactured. On the other hand,when an agent having the SH group and a methoxysilyl group at therespective terminal positions was used (e.g., HS(CH₂)_(m)Si(OCH₃)₃(where m is a whole number)), or in particular, when HS(CH₂)₃Si(OCH₃)₃or a similar formula was used, a fine gold particle with a formation ofa monomolecular film containing a reactive methoxysilyl group on thesurface via S was manufactured.

In Example 1, for the silanol condensation catalyst, groups ofcarboxylic acid metal salt, carboxylic acid ester metal salt, carboxylicacid metal salt polymer, carboxylic acid metal salt chelate, titanicacid ester, and titanic acid ester chelate are available. Morespecifically, stannous acetic acid, dibutyltin dilaurate, dibutyltindioctate, dibutyltin diacetate, dioctyltin dilaurate, dioctyltindioctate, dioctyltin diacetate, stannous dioctanoic acid, leadnaphthenate, cobalt naphthenate, iron 2-ethylhexanoate, dioctyltinbis-octylthioglycolate ester, dioctyltin maleate ester, dibutyltinmaleate polymer, dimethyltin mercaptopropionate polymer, dibutyltinbis-acetylacetate, dioctyltin bis-acetyl laurate, tetrabutyltitanate,tetranonyltitanate, and bis(acetylacetonyl)dipropyl titanate could beused.

For the film forming liquid, anhydrous organochlorine solvent,hydrocarbon solvent, fluorocarbon solvent, silicone solvent, or amixture of these were available as a solvent. If trying to increase thesilver particle concentration by evaporating the solvent withoutcleaning, the boiling point of the solvent is preferably between 50 and250 degrees Celsius. In addition, if the adsorption agent is analkoxysilane type and the organic coating is formed by evaporating thesolvent, an alcohol solvent, such as methanol, ethanol, propanol, or amixture of these, could be used in addition to the above listedsolvents.

More precisely, an organochlorine solvent, nonaqueous petroleum naphtha,solvent naphtha, petroleum ether, petroleum benzine, isoparaffin,n-paraffin, decalin, industrial gasoline, nonane, decane, kerosene,dimethyl silicone, phenyl silicone, alkyl modified silicone, polyethersilicone, dimethylformamide, or a mixture of these can be used.

In addition, the fluorocarbon solvent can be a chlorofluorocarbonsolvent, Fluorinert (a product manufactured by 3M Company), and Aflude(a product manufactured by Asahi Glass Co., Ltd.). These may be usedsolely, or two or more kinds may be mixed if the combination blendswell. In addition, an organochlorine solvent, such as chloroform, may beadded.

On the other hand, when a ketimine compound, organic acid, aldiminecompound, enamine compound, oxazolidine compound, or anaminoalkylalkoxysilane compound were used instead of the silanolcondensation catalyst, the processing time was reduced to about ½ to ⅔at the same concentration.

Moreover, when the silanol condensation catalyst was used mixing with aketimine compound, organic acid, aldimine compound, enamine compound,oxazolidine compound, or aminoalkylalkoxysilane compound (although theratio can vary from 1:9 to 9:1, it is normally preferable to be around1:1), the processing time was even several times faster (to aboutone-half hour), so that the time of film formation was reduced to afraction.

For example, when a dibutyltin oxide, which is a silanol catalyst, wasreplaced with H3 (from Japan Epoxy Resins Co., Ltd.), a ketiminecompound, and the other conditions remained the same, we obtained almostthe same results, except that the reaction time was reduced to about onehour.

Moreover, when the silanol catalyst was replaced with a mixture of H3(from Japan Epoxy Resins Co., Ltd.), a ketimine compound, and dibutyltinbis-acetylacetonate, a silanol catalyst (mixing ratio of 1:1), and theother conditions remained the same, we obtained almost the same results,except that the reaction time was reduced to about one-half hour.

Therefore, the above results clearly indicated that the ketiminecompound, organic acid, aldimine compound, enamine compound, oxazolidinecompound, and aminoalkylalkoxysilane compound are more active than thesilanol condensation catalyst.

Moreover, the activity was further enhanced when the silanolcondensation catalyst was mixed with one selected from a ketiminecompound, organic acid, aldimine compound, enamine compound, oxazolidinecompound, and aminoalkylalkoxysilane compound.

The available ketimine compounds are not particularly limited, andinclude the following examples: 2,5,8-triaza-1,8-nonadien;

-   3,11-dimethyl-4,7,10-triaza-3,10-tridecadien;-   2,10-dimethyl-3,6,9-triaza-2,9-undecadien;-   2,4,12,14-tetramethyl-5,8,11-triaza-4,11-pentadecadien;-   2,4,15,17-tetramethyl-5,8,11,14-tetraaza-4,14-octadecadien;-   2,4,20,22-tetramethyl-5,12,19-triaza-4,19-trieicosadien; etc.

There are also no particular limitations to the organic acids available;however, for example, formic acid, acetic acid, propionic acid, butyricacid, and malonic acid showed almost the same effect.

In the above examples, fine silver particles were used for theexplanation; however, any fine metal particles that contain activehydrogen, such as hydrogen of the hydroxyl group, on the surface areavailable as fine metal particles for the present invention, and inorder to ensure the conductivity, a fine metal particle that is made ofsilver or covered by silver was better.

In particular, it is applicable to fine particles made of silver,copper, and nickel, or silver-plated precious metal, copper, and nickel.

What is claimed is:
 1. A wiring comprising: first fine metal particlescovered by a first organic thin film formed by reaction of the firstfine metal particles with a diacetylene, the organic thin filmcovalently bound to a surface of the fine metal particles; and secondfine metal particles covered by a second organic thin film covalentlybound to a surface of the second fine metal particles, the secondorganic thin film comprising a chalcone at a first end and covalentlybound to the surface of the second fine metal particles via a Si or S ata second end; wherein: the wiring comprises the hardened reactionproduct of the first and second organic thin films; and the diacetyleneis HC≡C—C≡C(CH₂)₁₅SiCl₃; HC≡C—C≡C(CH₂)₂Si(CH₃)₂(CH₂)₁₅SiCl₃;HC≡C—C≡C(CH₂)₂Si(CH₃)₂(CH₂)₉SiCl₃; CH₃(CH₂)₃C≡C—C≡C(CH₂)₁₅SiCl₃;CH₃(CH₂)₃C≡C—C≡C(CH₂)₂Si(CH₃)₂(CH₂)₁₅SiCl₃; orCH₃(CH₂)₃C≡C—C≡C(CH₂)₂Si(CH₃)₂(CH₂)₉SiCl₃.
 2. The wiring of claim 1,wherein the first and second organic thin films covalently bound to thesurface comprise a monomolecular film.
 3. The wiring of claim 1 furthercomprising a base material upon which the first fine metal particlecovered by the first organic thin film and the second fine metalparticles covered by the second organic thin film are hardened.
 4. Thewiring of claim 1, wherein the first fine metal particles compriseindium tin oxide, tin oxide, gold, silver, copper, nickel, silver-platedgold, silver-plated copper, or silver-plated nickel.
 5. The wiring ofclaim 1, wherein the second fine metal particles comprise indium tinoxide, tin oxide, gold, silver, copper, nickel, silver-plated gold,silver-plated copper, or silver-plated nickel.
 6. An electroniccomponent comprising a wiring comprising: first fine metal particlescovered by a first organic thin film formed by reaction of the firstfine metal particles with a diacetylene; and second fine metal particlescovered by a second organic thin film covalently bound to a surface ofthe second fine metal particles, the second organic thin film comprisinga chalcone at a first end and covalently bound to the surface of thesecond fine metal particles via a Si or S at a second end; wherein: thewiring comprises the hardened reaction product of the first and secondorganic thin films; and the diacetylene is HC≡C—C≡C(CH₂)₁₅SiCl₃;HC≡C—C≡C(CH₂)₂Si(CH₃)₂(CH₂)₁₅SiCl₃; HC≡C—C≡C(CH₂)₂Si(CH₃)₂(CH₂)₉SiCl₃;CH₃(CH₂)₃C≡C—C≡C(CH₂)₁₅SiCl₃;CH₃(CH₂)₃C≡C—C≡C(CH₂)₂Si(CH₃)₂(CH₂)₁₅SiCl₃; orCH₃(CH₂)₃C≡C—C≡C(CH₂)₂Si(CH₃)₂(CH₂)₉SiCl₃.
 7. The electronic componentof claim 6, wherein the first fine metal particles comprise indium tinoxide, tin oxide, gold, silver, copper, nickel, silver-plated gold,silver-plated copper, or silver-plated nickel.
 8. The electroniccomponent of claim 6, wherein the second fine metal particles compriseindium tin oxide, tin oxide, gold, silver, copper, nickel, silver-platedgold, silver-plated copper, or silver-plated nickel.
 9. The electroniccomponent of claim 6, wherein the organic thin film covalently bound tothe surface comprises a monomolecular film.
 10. The electronic componentof claim 6 further comprising a base material upon which the first finemetal particle covered by the first organic thin film and the secondfine metal particles covered by the second organic thin film arehardened.
 11. An electronic device comprising a wiring comprising: firstfine metal particles covered by a first organic thin film formed byreaction of the first fine metal particles with a diacetylene; andsecond fine metal particles covered by a second organic thin filmcovalently bound to a surface of the second fine metal particles, thesecond organic thin film comprising a chalcone at a first end andcovalently bound to the surface of the second fine metal particles via aSi or S at a second end; wherein: the wiring comprises the hardenedreaction product of the first and second organic thin films; and thediacetylene is HC≡C—C≡C(CH₂)₁₅SiCl₃; HC≡C—C≡C(CH₂)₂Si(CH₃)₂(CH₂)₁₅SiCl₃;HC≡C—C≡C(CH₂)₂Si(CH₃)₂(CH₂)₉SiCl₃; CH₃(CH₂)₃C≡C—C≡C(CH₂)₁₅SiCl₃;CH₃(CH₂)₃C≡C—C≡C(CH₂)₂Si(CH₃)₂(CH₂)₁₅SiCl₃; orCH₃(CH₂)₃C≡C—C≡C(CH₂)₂Si(CH₃)₂(CH₂)₉SiCl₃.
 12. The electronic device ofclaim 11, wherein the first fine metal particles comprise indium tinoxide, tin oxide, gold, silver, copper, nickel, silver-plated gold,silver-plated copper, or silver-plated nickel.
 13. The electronic deviceof claim 11, wherein the second fine metal particles comprise indium tinoxide, tin oxide, gold, silver, copper, nickel, silver-plated gold,silver-plated copper, or silver-plated nickel.
 14. The electronic deviceof claim 11, wherein the organic thin film covalently bound to thesurface comprises a monomolecular film.
 15. The electronic device ofclaim 11 further comprising a base material upon which the first finemetal particle covered by the first organic thin film and the secondfine metal particles covered by the second organic thin film arehardened.